发明名称 |
PROCESS FOR DEPOSITING AN ANTI-REFLECTIVE LAYER ON A SUBSTRATE |
摘要 |
The present invention relates to a process for depositing an anti-reflective layer on a transparent flat substrate comprising the steps of providing a liquid coating composition comprising at least one solvent, at least one inorganic oxide precursor, and at least one pore forming agent; applying the coating composition to the substrate; drying the applied coating layer, and curing the coating layer; wherein during drying a gas flow is provided to the substrate at a flow rate of between 0.2 and 6 m/s. The advantage of this process is that defects visible in edge areas of the coated substrate can be significantly reduced. |
申请公布号 |
US2014030429(A1) |
申请公布日期 |
2014.01.30 |
申请号 |
US201213982339 |
申请日期 |
2012.02.06 |
申请人 |
ABEN GERARDUS;DE RIJK RONNIE BERNARDUS MARIA;VRIJALDENHOVEN PATRICK WILHELMUS ANTONIUS;DSM IP ASSETS B.V. |
发明人 |
ABEN GERARDUS;DE RIJK RONNIE BERNARDUS MARIA;VRIJALDENHOVEN PATRICK WILHELMUS ANTONIUS |
分类号 |
B05D5/06 |
主分类号 |
B05D5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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