发明名称 SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a silicon carbide MOSFET capable of moderating the electric field applied to an oxide film at the time of off.SOLUTION: In a silicon carbide MOSFET, an electric-field relaxation region is provided on the entire surface directly under a gate oxide film in a JFET region. The electric-field relaxation region is formed to shallower than a well region. The impurity concentration of the electric-field relaxation region is set to be higher than the impurity concentration of a region shallower than the electric-field relaxation region in the well region.
申请公布号 JP2014017376(A) 申请公布日期 2014.01.30
申请号 JP20120153783 申请日期 2012.07.09
申请人 MITSUBISHI ELECTRIC CORP 发明人 WATANABE TOMOKATSU;MIURA NARIHISA;HINO SHIRO;EBIIKE YUJI;NAKAO YUKIYASU
分类号 H01L29/78;H01L21/336;H01L29/12 主分类号 H01L29/78
代理机构 代理人
主权项
地址