发明名称 |
SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a silicon carbide MOSFET capable of moderating the electric field applied to an oxide film at the time of off.SOLUTION: In a silicon carbide MOSFET, an electric-field relaxation region is provided on the entire surface directly under a gate oxide film in a JFET region. The electric-field relaxation region is formed to shallower than a well region. The impurity concentration of the electric-field relaxation region is set to be higher than the impurity concentration of a region shallower than the electric-field relaxation region in the well region. |
申请公布号 |
JP2014017376(A) |
申请公布日期 |
2014.01.30 |
申请号 |
JP20120153783 |
申请日期 |
2012.07.09 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
WATANABE TOMOKATSU;MIURA NARIHISA;HINO SHIRO;EBIIKE YUJI;NAKAO YUKIYASU |
分类号 |
H01L29/78;H01L21/336;H01L29/12 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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