| 摘要 |
PROBLEM TO BE SOLVED: To provide an active light-sensitive or radiation-sensitive resin capable of forming a pattern simultaneously satisfying high sensitivity, high resolution (such as high resolution, excellent pattern shape and small line edge roughness (LER)) and satisfactory dry etching resistance, and further having excellent scum characteristics and excellent stability with the lapse of time.SOLUTION: The active light-sensitive or radiation-sensitive resin composition comprises a compound generating acid by the irradiation of active light or radiation, and the acid is connected with a group expressed by the general formula (M) via a covalent bond (wherein, Yand Yrespectively independently denote a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group or an acyl group; Z denotes a hydrogen atom or a substituent; and * denotes the connection site with the residue of the compound (A)). |
