| 摘要 |
PROBLEM TO BE SOLVED: To remove particles from a substrate while inhibiting or preventing the destruction of a pattern.SOLUTION: A substrate processing apparatus 1 includes: a spin chuck 6 which holds a substrate W; a cleaning fluid nozzle 9 for supplying a cleaning fluid including a foaming agent, which foams when foaming energy is provided thereto, to the substrate W held by the spin chuck 6; and a heater 20 and an ultrasonic vibrator 21 which provide the foam energy to the cleaning fluid contacting with the substrate W held by the spin chuck 6. |
