发明名称 PHOTOSENSITIVE PASTE AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive paste capable of forming pattern excellent in pyrolytic property of an organic component during firing, having low carbon residue after firing and high reflectance, and to provide a panel for a flat display containing the pattern having low carbon residue and high reflectance, excellent in display properties including luminance and having high reliability, and to provide a pattern forming method suitable for a scintillator panel, etc.SOLUTION: A photosensitive paste containing a glass powder, an acrylic copolymer containing 0.5 to 23 mass% of a repeating unit derived from styrene, etc. and having an acid value of 30 to 70 mgKOH/g, a photoinitiator, and a photosensitive monomer is provided.
申请公布号 JP2014016606(A) 申请公布日期 2014.01.30
申请号 JP20130120373 申请日期 2013.06.07
申请人 TORAY IND INC 发明人 YAMAMOTO YOHEI;KOBAYASHI YASUHIRO;YANO TAKAHIRO;TAKASE KOHEI
分类号 G03F7/033;C08F220/18;G03F7/004;G03F7/40 主分类号 G03F7/033
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