发明名称 PATTERN DIMENSION CALCULATION METHOD AND IMAGE ANALYSIS DEVICE
摘要 PROBLEM TO BE SOLVED: To enable a calculation of a pattern dimension in any local position of a contour line or a specific part thereof easily, and to obtain an image data analysis capable of accurately calculating a representative dimension value of the contour line.SOLUTION: The pattern dimension calculation method according to the present invention is configured to: create coordinate data of each apex of polygon contour data to be obtained on the basis of image data imaged by a scanning electron microscope; calculate a region where contour data on an inspection target pattern and rectangle data for measuring a length are overlapped with each other; calculate a target dimension value from an area of the overlapped region; upon calculating the target dimension value, generate an auxiliary line perpendicular to a counter side crossing the rectangular overlapped region of the rectangle data for measuring the length in the overlapped region; divide the overlapped region into a plurality of trapezoidal regions by drawing a vertical line from each apex of which the coordinate data is created with respect to the auxiliary line; calculate an area of the overlapped region from a total sum of areas of each trapezoidal region; and divide the area of the overlapped region by a dimension of a side serving as the rectangle data for measuring the length and not crossing the contour data and thereby calculate the target dimension value.
申请公布号 JP2014016361(A) 申请公布日期 2014.01.30
申请号 JP20130198199 申请日期 2013.09.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SUGIYAMA AKIYUKI;MATSUOKA RYOICHI;ONIZAWA AKIHIRO;KAKINUMA TAKESHI
分类号 G01B15/00;G01B15/04 主分类号 G01B15/00
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