发明名称 |
PATTERN DIMENSION CALCULATION METHOD AND IMAGE ANALYSIS DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To enable a calculation of a pattern dimension in any local position of a contour line or a specific part thereof easily, and to obtain an image data analysis capable of accurately calculating a representative dimension value of the contour line.SOLUTION: The pattern dimension calculation method according to the present invention is configured to: create coordinate data of each apex of polygon contour data to be obtained on the basis of image data imaged by a scanning electron microscope; calculate a region where contour data on an inspection target pattern and rectangle data for measuring a length are overlapped with each other; calculate a target dimension value from an area of the overlapped region; upon calculating the target dimension value, generate an auxiliary line perpendicular to a counter side crossing the rectangular overlapped region of the rectangle data for measuring the length in the overlapped region; divide the overlapped region into a plurality of trapezoidal regions by drawing a vertical line from each apex of which the coordinate data is created with respect to the auxiliary line; calculate an area of the overlapped region from a total sum of areas of each trapezoidal region; and divide the area of the overlapped region by a dimension of a side serving as the rectangle data for measuring the length and not crossing the contour data and thereby calculate the target dimension value. |
申请公布号 |
JP2014016361(A) |
申请公布日期 |
2014.01.30 |
申请号 |
JP20130198199 |
申请日期 |
2013.09.25 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SUGIYAMA AKIYUKI;MATSUOKA RYOICHI;ONIZAWA AKIHIRO;KAKINUMA TAKESHI |
分类号 |
G01B15/00;G01B15/04 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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