发明名称 SEMICONDUCTOR LAMINATE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR ELEMENT
摘要 A semiconductor laminate having small electric resistivity in the thickness direction; a process for producing the semiconductor laminate; and a semiconductor element equipped with the semiconductor laminate. include a semiconductor laminate including a Ga203 substrate; an AlGalnN buffer layer which is formed on the Ga203 substrate; a nitride semiconductor layer which is formed on the AlGalnN buffer layer and contains Si; and an Si-rich region which is formed in an area located on the AlGalnN buffer layer side in the nitride semiconductor layer and has an Si concentration of 5×1018/cm3 or more.
申请公布号 US2014027770(A1) 申请公布日期 2014.01.30
申请号 US201214110420 申请日期 2012.04.03
申请人 IIZUKA KAZUYUKI;MORISHIMA YOSHIKATSU;SATO SHINKURO 发明人 IIZUKA KAZUYUKI;MORISHIMA YOSHIKATSU;SATO SHINKURO
分类号 H01L29/267 主分类号 H01L29/267
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