NOZZLE CLEANING DEVICE, APPLICATION PROCESSING DEVICE, NOZZLE CLEANING METHOD, APPLICATION PROCESSING METHOD, PROGRAM, AND COMPUTER STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To properly clean a nozzle extending in a width direction of a substrate and where a discharge port for discharging a coating liquid to the substrate is formed on a lower surface.SOLUTION: A nozzle cleaning device includes: a cleaning part 110 which cleans at least a lower surface of a slit nozzle; and a cleaning part moving mechanism which moves the cleaning part 110 along a longitudinal direction of the slit nozzle. The cleaning part 110 includes: multiple contact members 120 which may contact with the at least lower surface of the slit nozzle; a horizontal movement mechanism 167 which moves the respective contact parts 120 in a horizontal direction; a vertical movement mechanism which moves the respective contact parts 120 in a vertical direction; a cleaning fluid supply mechanism 121 which supplies a cleaning fluid to the at least lower surface of the slit nozzle; and a gas supply mechanism 122 which supplies a dry gas to the at least lower surface of the slit nozzle.