发明名称 |
ZnO FILM PRODUCTION DEVICE, AND PRODUCTION METHOD |
摘要 |
This ZnO film production method involves an installation step in which a substrate (2) is installed on an installation base (3), and a film formation step in which a control device (CONT) controls a heating means (heaters (H1, H2, H3)) such that the temperature (T1) of a first starting material storing part (R1), the temperature (T2) of a second starting material storing part (R2), and the temperature (T3) of the installation base (3) on which the substrate (2) is installed satisfy the relationship of T1<T2<T3 while chlorine gas is supplied to the first starting material storing part (R1) from a chlorine gas supply source and oxygen gas is supplied into a reaction container (1) from a third gas supply source (oxygen gas supply source) (G3). It is possible to produce high-quality ZnO films by means of said production method. |
申请公布号 |
WO2014017229(A1) |
申请公布日期 |
2014.01.30 |
申请号 |
WO2013JP66863 |
申请日期 |
2013.06.19 |
申请人 |
TOKYO ELECTRON LIMITED;NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY |
发明人 |
KANG SONG YUN;KUMAGAI YOSHINAO;KOUKITU AKINORI |
分类号 |
C23C16/448;C23C16/40;H01L21/205 |
主分类号 |
C23C16/448 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|