发明名称 ZnO FILM PRODUCTION DEVICE, AND PRODUCTION METHOD
摘要 This ZnO film production method involves an installation step in which a substrate (2) is installed on an installation base (3), and a film formation step in which a control device (CONT) controls a heating means (heaters (H1, H2, H3)) such that the temperature (T1) of a first starting material storing part (R1), the temperature (T2) of a second starting material storing part (R2), and the temperature (T3) of the installation base (3) on which the substrate (2) is installed satisfy the relationship of T1<T2<T3 while chlorine gas is supplied to the first starting material storing part (R1) from a chlorine gas supply source and oxygen gas is supplied into a reaction container (1) from a third gas supply source (oxygen gas supply source) (G3). It is possible to produce high-quality ZnO films by means of said production method.
申请公布号 WO2014017229(A1) 申请公布日期 2014.01.30
申请号 WO2013JP66863 申请日期 2013.06.19
申请人 TOKYO ELECTRON LIMITED;NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY 发明人 KANG SONG YUN;KUMAGAI YOSHINAO;KOUKITU AKINORI
分类号 C23C16/448;C23C16/40;H01L21/205 主分类号 C23C16/448
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