发明名称 Micro mirror for projection exposure system such as extreme UV (EUV) projection exposure system, has mirror element which is tiltable formed around axis, and coil spring is provided to bias mirror element in basic position
摘要 <p>The micro mirror has a mirror element which is tiltable formed around the axis. A coil spring is provided to bias the mirror element in a basic position, and is formed of two different materials. The spiral spring comprises primary material, from which spiral spring core is formed, and secondary material from which two opposite outer sides of the spiral spring core are formed. The spring core comprises quadratic or rectangular cross section. The primary material is made from silicon and the secondary material is made from copper, silver, gold, aluminum, carbon and diamond. An independent claim is included for method for manufacturing micro mirror.</p>
申请公布号 DE102013200531(A1) 申请公布日期 2014.01.30
申请号 DE201310200531 申请日期 2013.01.16
申请人 CARL ZEISS SMT GMBH 发明人 SAROV, YANKO
分类号 B81C3/00;B81C1/00;G02B5/08;G03F7/20 主分类号 B81C3/00
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