发明名称 GAS BARRIER FILM
摘要 An object of the invention is to provide a gas barrier characteristic film that has a gas barrier characteristic and that is excellent in the repetitive reproducibility of the gas barrier characteristic. The film is a gas barrier characteristic film in which an [A] layer and a [B] layer mentioned below are sequentially layered on at least one surface of a macromolecular base, the [A] layer being a crosslinked resin layer whose pencil hardness is greater than or equal to H and whose surface free energy is less than or equal to 45 mN/m, and the [B] layer being a silicon-containing inorganic layer whose thickness is 10 to 1000 nm.
申请公布号 US2014026961(A1) 申请公布日期 2014.01.30
申请号 US201214009664 申请日期 2012.03.29
申请人 UEBAYASHI HIROYUKI;TSKAMURA YUSUKE;WATANABE OSAMU;TORAY INDUSTRIES, INC. 发明人 UEBAYASHI HIROYUKI;TSKAMURA YUSUKE;WATANABE OSAMU
分类号 H01L23/29;H01L23/00;H01L31/0203;H01L33/54 主分类号 H01L23/29
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