发明名称 |
EXCIMER LASER APPARATUS PROJECTING A BEAM WITH A SELECTIVELY VARIABLE SHORT-AXIS BEAM PROFILE |
摘要 |
Apparatus for homogenizing and projecting two laser-beams is arranged such that the projected homogenized beams are aligned parallel to each other in a first transverse axis and partially overlap in second transverse axis perpendicular to the first transverse axis. The projected homogenized laser-beams have different intensities in the second axis and the degree of partial overlap is selected such that the combined intensity of the laser beams in the second axis has a step profile. |
申请公布号 |
US2014027417(A1) |
申请公布日期 |
2014.01.30 |
申请号 |
US201213557073 |
申请日期 |
2012.07.24 |
申请人 |
SIMON FRANK;VAN DER WILT PAUL;SCHWENGER LUDWIG;COHERENT GMBH |
发明人 |
SIMON FRANK;VAN DER WILT PAUL;SCHWENGER LUDWIG |
分类号 |
B23K26/00 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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