发明名称 PHOTO-ALIGNING EXPOSURE METHOD AND PHOTO-ALIGNING EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To eliminate alignment disturbance near a boundary in a divided region of a unit image region when an alignment exposure system is applied to a multidomain method.SOLUTION: A photo-alignment exposure method is provided, in which each unit image region Pa of a liquid crystal display element is divided into a plurality of divided regions Da1 and Da2, and alignment material films in the divided regions are aligned by light into different directions from each other. The method includes: a first exposure step of irradiating the whole exposure target surface of the unit image region Pa with light inclined at an irradiation angle &thetas;1; and a second exposure step of irradiating one region (a second divided region Da2) of the divided regions with light inclined at an irradiation angle &thetas;2 that is different from the irradiation angle in the first exposure step. In the second exposure step, the light is projected through a mask pattern corresponding to the one region (the second divided region Da2) of the divided regions, and transmitted light from the mask pattern is condensed by condensing means 13 to irradiate the second divided region Da2 to be exposed.
申请公布号 JP2014016379(A) 申请公布日期 2014.01.30
申请号 JP20120151629 申请日期 2012.07.05
申请人 V TECHNOLOGY CO LTD 发明人 KAJIYAMA KOICHI;HASHIMOTO KAZUSHIGE;ARAI TOSHINARI
分类号 G02F1/1337 主分类号 G02F1/1337
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