| 摘要 |
<p>A plasma treatment device according to one embodiment of the present invention is provided with a treatment container, an antenna, microwave generators, and a stage. The treatment container demarcates a treatment space. The antenna is provided to an upper region of the treatment space, and has a discoid waveguide having a prescribed axis at the centre thereof. The microwave generators are connected to the antenna. The stage is provided inside the treatment container, and faces the antenna with the treatment space therebetween so as to intersect the prescribed axis. The antenna includes a metal plate which demarcates the waveguide from a lower region. In the metal plate, a plurality of apertures are provided along a first circle having the prescribed axis at the centre thereof, and a second circle which has the prescribed axis at the centre thereof, and which has a diameter larger than that of the first circle. The antenna includes a plurality of protruded portions which comprise a dielectric material, and which extend through the plurality of apertures into the treatment space.</p> |
