发明名称 TARGETS AND PROCESSES FOR FABRICATING SAME
摘要 In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 mum. In particular examples, the distance is less than about 1 mum. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.
申请公布号 US2014030542(A1) 申请公布日期 2014.01.30
申请号 US201313839973 申请日期 2013.03.15
申请人 ADAMS JESSE D.;MALEKOS STEVEN;LE GALLOUDEC NATHALIE;KORGAN GRANT;COWAN THOMAS;SENTOKU YASUHIKO 发明人 ADAMS JESSE D.;MALEKOS STEVEN;LE GALLOUDEC NATHALIE;KORGAN GRANT;COWAN THOMAS;SENTOKU YASUHIKO
分类号 H05H1/02 主分类号 H05H1/02
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