发明名称 ALTERNATE PAD STRUCTURES/PASSIVATION INTEGRATION SCHEMES TO REDUCE OR ELIMINATE IMC CRACKING IN POST WIRE BONDED DIES DURING CU/LOW-K BEOL PROCESSING
摘要 Passivation integration schemes and pad structures to reduce the stress gradients and/or improve the contact surface existing between the Al in the pad and the gold wire bond. One of the pad structures provides a plurality of recessed pad areas which are formed in a single aluminum pad. An oxide mesa can he provided under the aluminum pad. Another pad structure provides a single recessed pad area which is formed in a single aluminum pad, and the aluminum pad is disposed above a copper pad and a plurality of trench/via pads. Still another pad structure provides a single recessed pad area which is formed in a single aluminum pad, and the aluminum pad is disposed above a portion of a copper pad, such that the aluminum pad and the copper pad are staggered relative to each other.
申请公布号 US2014030541(A1) 申请公布日期 2014.01.30
申请号 US201314045081 申请日期 2013.10.03
申请人 LSI CORPORATION 发明人 BHATT HEMANSHU;VIJAY DILIP;PALLINTI JAYANTHI;SUN SEY-SHING;YING HONG;KAO CHI-YI
分类号 H05K1/02;H05K3/10 主分类号 H05K1/02
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