| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for film formation which enables formation of a functional film having uniformly distributed pores in a simple way and at low cost, the composition having excellent liquid stability.SOLUTION: A mixed solution contains a solvent, metal or metalloid oxide particles surface-treated with a compound represented by formula (1), and the compound represented by formula (1) and/or a hydrolysis condensate thereof, and the mixed solution is subjected to ultrasonic treatment and/or bubbling treatment to obtain a composition for film formation, where the formula (1) is: (X)M(Y). |
