| 发明名称 |
METHOD AND APPARATUS FOR PREPARING POLYSILAZANE ON A SEMICONDUCTOR WAFER |
| 摘要 |
A method for depositing a polysilazane on a semiconductor wafer is provided. The method includes steps of disposing a silazane onto the semiconductor wafer, and heating the silazane to form the polysilazane on the semiconductor wafer. An apparatus for preparing a polysilazane on a semiconductor wafer is also provided. |
| 申请公布号 |
US2014030866(A1) |
申请公布日期 |
2014.01.30 |
| 申请号 |
US201213558284 |
申请日期 |
2012.07.25 |
| 申请人 |
CHOU YOU-HUA;LEE CHIH-TSUNG;HONG MIN-HAO;LIEN MING-HUEI;WU CHIH-JEN;HUANG CHEN-MING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHOU YOU-HUA;LEE CHIH-TSUNG;HONG MIN-HAO;LIEN MING-HUEI;WU CHIH-JEN;HUANG CHEN-MING |
| 分类号 |
H01L21/762;H01L21/314 |
主分类号 |
H01L21/762 |
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