| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist stripping apparatus that can reliably and efficiently remove resist deposited on a substrate. SOLUTION: A resist removing apparatus for removing resist deposited on a surface of the substrate includes: a first supply part 35 for supplying sulfuric acid to the substrate; a second supply part 36 for supplying ozone gas for atomizing the sulfuric acid to be supplied to the substrate; and a third supply part 37 for generating heat of reaction by supplying superheated steam to the sulfuric acid atomized by the ozone gas. COPYRIGHT: (C)2010,JPO&INPIT |
