发明名称 |
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR CONTROLLING THE SAME |
摘要 |
<p>There is disclosed a plasma enhanced chemical vapor deposition apparatus including a loading station to load an object on a pallet, an operation station to form a functional film by performing plasma reaction to the object loaded on the pallet, a unloading station to separate the object from the pallet, a circulation station to convey the pallet from the unloading station to the loading station, and a conveyer to convey the pallet to the stations sequentially to circulate the pallet.</p> |
申请公布号 |
EP2689050(A2) |
申请公布日期 |
2014.01.29 |
申请号 |
EP20120765504 |
申请日期 |
2012.03.16 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
OH, JUNGGEUN;LEE, KWANGHO;LEE, JANGWOO;KIM, JEONGGYU;SHIN, JINHYOUK |
分类号 |
C23C16/50;C23C16/44;C23C16/513 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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