THIN FILM DEPOSITING APPARATUS AND THE THIN FILM DEPOSITING METHOD USING THE SAME

摘要

A thin film depositing device and a thin film method using the same are disclosed. The disclosed device includes a chamber in which a substrate is installed, a discharge unit discharging deposition steam to the substrate, a source supply unit supplying a source of the steam to the discharge unit, and a heating unit heating the source at an unsolidified temperature. According to the composition, as the temperature of the deposition steam source can be maintained in a high temperature state suitable for film deposition, a material of a property being solidified at a high temperature can be used as the deposition steam source and various thin film properties can be made as a result.