| 摘要 |
The invention provides a projection optical system, an exposure device as well as a method for producing the device. A first concave reflecting plane, a convex reflecting plane and a second concave reflecting plane are configured in sequence in the light path from the object surface to the image surface, and the projection optical system for projecting the image of the object equipped on the object surface to the image surface is equipped with a first and a second refractive optical unit in the light path; the first actuator, the second actuator, the first and the second refractive optical units are respectively equipped with more than two column-shaped surfaces, and the first refractive optical unit can adjust the projection multiplying factor of the projection optical system, and the second refractive optical unit can adjust the projection multiplying factor of the projection optical system on the second direction which is orthogonal with the first direction, and the first actuator changes the intervals between more than two column-shaped surfaces of the first refractive optical unit, thereby causing the projection multiplying factor on the first direction to became the first target projection multiplying factor, and the second actuator changes the intervals between more than two column-shaped surfaces of the second refractive optical unit, thereby causing the projection multiplying factor on the second direction to became the second target projection multiplying factor. |
