发明名称 Manufacturing an semiconductor chip underfill using air vent
摘要 A method for manufacturing an underfill in a semiconductor chip stack having a cavity 4 between a first surface (2, figure 1) and a second surface (3). The cavity has multiple access 109 and vent 110 holes in at least one of the said surfaces. Viscous filling material (13) is applied through the access hole into the cavity thereby squeezing air or gas through the vent holes. The filler material may comprise of a carrier fluid 16 and filler particles 17, and be applied to the access holes by way of a dispenser tube 14. The filler material occupies the space within the cavity such that it surrounds solder balls 7. Once the filler material fills the cavity between a particular access hole and vent hole the filler material may instead be inserted through said vent hole. The vent holes may also comprise a filter element which restricts the filler particles 17 from exiting the cavity.
申请公布号 GB2504343(A) 申请公布日期 2014.01.29
申请号 GB20120013365 申请日期 2012.07.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 THOMAS J BRUNSCHWILER;JAVIER V GOICOCHEA;STEFANO OGGIONI;GERD SCHLOTTIG
分类号 H01L21/56 主分类号 H01L21/56
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