| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor-deposition apparatus which can form a vapor-deposition film on the whole area of the outer peripheral surface of a sample without blocking the vapor supplied from a vapor-deposition source while making the vapor exist on an approximately whole outer peripheral area of the sample, and to provide a vapor-deposition method using the vapor-deposition apparatus. SOLUTION: The vapor-deposition apparatus includes: a holder 2 that has a shape like a coil spring of which the center axis is directed horizontally; and a rotation means which rotates the holder around the center axis of the holder in a state of holding the sample 1 inside the holder. The vapor-deposition method includes: making the holder rotate around the center axis of the holder by using the rotation means to rotate the sample with respect to the holder and change the direction and the attitude of the sample with respect to the vapor-deposition source; and forming the vapor-deposition film of the vapor supplied from the vapor-deposition source on the whole area of the outer peripheral surface of the sample while making the holder change the direction and the attitude of the sample. COPYRIGHT: (C)2010,JPO&INPIT |
