NAIL POLISH REMOVER COMPOSITION AND ITS USE

摘要

The present invention relates to a water based nail polish remover composition comprising an anionic surfactant, a water soluble solvent, and water; wherein the anionic surfactant is selected from the group consisting of secondary C6-C22-alkane sulfonate trialcohol amine salts and mixtures thereof. The invention also relates to the use of the composition for removing nail polish.