发明名称 ELECTRODE COATING MATERIAL, ELECTRODE STRUCTURE AND SEMICONDUCTOR DEVICE
摘要 <p>A semiconductor device is composed of a filed effect transistor having a gate electrode (13), a gate insulating layer (14), a channel forming region (16) composed of an organic semiconductor material layer and a source/drain electrode (15) made of a metal. A portion of the source/drain electrode (15) in contact with the organic semiconductor material layer constituting the channel forming region (16) is covered with an electrode coating material (21). Since the electrode coating material (21) is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode (15) composed of the metal, low contact resistance and high mobility can be achieved.</p>
申请公布号 EP2091077(B1) 申请公布日期 2014.01.29
申请号 EP20070832311 申请日期 2007.11.21
申请人 SONY CORPORATION 发明人 MURATA, MASAKI;YONEYA, NOBUHIDE;KIMURA, NORIO
分类号 H01L51/05;H01L51/00;H01L51/10 主分类号 H01L51/05
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