| 摘要 |
While a wafer stage (WST) linearly moves in a Y-axis direction, a multipoint AF system (90a, 90b) detects surface position information of the surface of a wafer (W) at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems (AL1, AL2 1 to AL2 4 ) that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer (W). That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved, compared with the case where a detection operation of the marks and a detection operation of the surface position information (focus information) are independently performed. |
