| 发明名称 |
Device housing and method for making the same |
| 摘要 |
A device housing is provided. The device housing includes a substrate, a silicon dioxide film formed on the substrate, and a zinc oxide film formed on the silicon dioxide film. The silicon dioxide film has micrometer sized structures. The zinc oxide film has nanometer sized structures. A method for making the device housing is also described there. |
| 申请公布号 |
US8637862(B2) |
申请公布日期 |
2014.01.28 |
| 申请号 |
US201113087512 |
申请日期 |
2011.04.15 |
| 申请人 |
CHANG HSIN-PEI;CHEN WEN-RONG;CHIANG HUANN-WU;CHEN CHENG-SHI;WANG YING-YING;HONG FU JIN PRECISION INDUSTRY (SHENZHEN) CO., LTD;HON HAI PRECISION INDUSTRY CO., LTD. |
发明人 |
CHANG HSIN-PEI;CHEN WEN-RONG;CHIANG HUANN-WU;CHEN CHENG-SHI;WANG YING-YING |
| 分类号 |
H01L29/10 |
主分类号 |
H01L29/10 |
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