发明名称 |
Low cost anti-fuse structure |
摘要 |
An anti-fuse structure is provided in which an anti-fuse material liner is embedded within one of the openings provided within an interconnect dielectric material. The anti-fuse material liner is located between a first conductive metal and a second conductive metal which are also present within the opening. A diffusion barrier liner separates the first conductive metal from any portion of the interconnect dielectric material. The anti-fuse structure is laterally adjacent an interconnect structure that is formed within the same interconnect dielectric material as the anti-fuse structure. |
申请公布号 |
US8637957(B1) |
申请公布日期 |
2014.01.28 |
申请号 |
US201213552293 |
申请日期 |
2012.07.18 |
申请人 |
YANG CHIH-CHAO;GATES STEPHEN M.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
YANG CHIH-CHAO;GATES STEPHEN M. |
分类号 |
H01L29/00 |
主分类号 |
H01L29/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|