发明名称 Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition
摘要 Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Ra represents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; R1 represents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; "A" represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; "m" denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; "n" denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.
申请公布号 US8637623(B2) 申请公布日期 2014.01.28
申请号 US20090863924 申请日期 2009.02.03
申请人 KOYAMA HIROSHI;KITAO KYUHEI;EGUCHI AKIRA;DAICEL CHEMICAL INDUSTRIES, LTD. 发明人 KOYAMA HIROSHI;KITAO KYUHEI;EGUCHI AKIRA
分类号 C08F20/10;C07C69/01;C07C69/013;C07D317/06;C08F20/22;C08F20/26;C08F20/34;G03F7/004;G03F7/26 主分类号 C08F20/10
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