发明名称 |
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM |
摘要 |
The purpose of the present invention is to provide a substrate processing method etc. capable of suppressing the volatilization of a fluorine-containing organic solvent for dry prevention until a substrate is carried into a processing container, and the decomposition of the fluorine-containing organic solvent within the processing container. A substrate (W) in which the surface is covered by a first fluorine-containing organic solvent is carried into a processing container (31). A high pressure fluid made of a second fluorine-containing organic solvent in which the boiling point is lower than the first fluorine-containing organic solvent is provided to the processing container (31). A high pressure fluid condition of a compound of the first and second fluorine-containing organic solvents is formed within the processing container (31). The first fluorine-containing organic solvent which covers the surface of the substrate is removed. A dried substrate (W) is obtained by discharging the fluid within the processing container (31) as the state of the high pressure fluid or gas. [Reference numerals] (321) Feeding unit; (5) Control unit |
申请公布号 |
KR20140011269(A) |
申请公布日期 |
2014.01.28 |
申请号 |
KR20130082873 |
申请日期 |
2013.07.15 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HAYASHI HIDEKAZU;SATO YOHEI;OKUCHI HISAHI;TOMITA HIROSHI;MITSUOKA KAZUYUKI;YOU GEN;OHNO HIROKI;ORII TAKEHIKO;TOSHIMA TAKAYUKI |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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