发明名称 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM
摘要 The purpose of the present invention is to provide a substrate processing method etc. capable of suppressing the volatilization of a fluorine-containing organic solvent for dry prevention until a substrate is carried into a processing container, and the decomposition of the fluorine-containing organic solvent within the processing container. A substrate (W) in which the surface is covered by a first fluorine-containing organic solvent is carried into a processing container (31). A high pressure fluid made of a second fluorine-containing organic solvent in which the boiling point is lower than the first fluorine-containing organic solvent is provided to the processing container (31). A high pressure fluid condition of a compound of the first and second fluorine-containing organic solvents is formed within the processing container (31). The first fluorine-containing organic solvent which covers the surface of the substrate is removed. A dried substrate (W) is obtained by discharging the fluid within the processing container (31) as the state of the high pressure fluid or gas. [Reference numerals] (321) Feeding unit; (5) Control unit
申请公布号 KR20140011269(A) 申请公布日期 2014.01.28
申请号 KR20130082873 申请日期 2013.07.15
申请人 TOKYO ELECTRON LIMITED 发明人 HAYASHI HIDEKAZU;SATO YOHEI;OKUCHI HISAHI;TOMITA HIROSHI;MITSUOKA KAZUYUKI;YOU GEN;OHNO HIROKI;ORII TAKEHIKO;TOSHIMA TAKAYUKI
分类号 H01L21/302 主分类号 H01L21/302
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