发明名称 |
Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets |
摘要 |
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects. |
申请公布号 |
US8638415(B2) |
申请公布日期 |
2014.01.28 |
申请号 |
US20090567617 |
申请日期 |
2009.09.25 |
申请人 |
STREEFKERK BOB;DONDERS SJOERD NICOLAAS LAMBERTUS;LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS;ASML NETHERLANDS B.V. |
发明人 |
STREEFKERK BOB;DONDERS SJOERD NICOLAAS LAMBERTUS;LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS |
分类号 |
G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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