| 发明名称 |
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition |
| 摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. |
| 申请公布号 |
US8637220(B2) |
申请公布日期 |
2014.01.28 |
| 申请号 |
US201113172025 |
申请日期 |
2011.06.29 |
| 申请人 |
TSUCHIMURA TOMOTAKA;TSUBAKI HIDEAKI;TAKAHASHI TOSHIYA;FUJIFILM CORPORATION |
发明人 |
TSUCHIMURA TOMOTAKA;TSUBAKI HIDEAKI;TAKAHASHI TOSHIYA |
| 分类号 |
G03F7/004;G03F7/039 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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