发明名称 |
Hierarchical nanopatterns by nanoimprint lithography |
摘要 |
A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure. |
申请公布号 |
US8636937(B2) |
申请公布日期 |
2014.01.28 |
申请号 |
US20080083829 |
申请日期 |
2008.04.18 |
申请人 |
ZHANG FENGXIANG;LOW HONG YEE;AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
ZHANG FENGXIANG;LOW HONG YEE |
分类号 |
B29C59/02 |
主分类号 |
B29C59/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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