发明名称 |
Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern |
摘要 |
A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method. |
申请公布号 |
US8637222(B2) |
申请公布日期 |
2014.01.28 |
申请号 |
US201013146976 |
申请日期 |
2010.01.29 |
申请人 |
TSUCHIHASHI TORU;YATSUO TADATERU;SHIRAKAWA KOJI;TSUBAKI HIDEAKI;ASANO AKIRA;FUJIFILM CORPORATION |
发明人 |
TSUCHIHASHI TORU;YATSUO TADATERU;SHIRAKAWA KOJI;TSUBAKI HIDEAKI;ASANO AKIRA |
分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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