发明名称 Methods of forming a non-volatile resistive oxide memory array
摘要 A method of forming a non-volatile resistive oxide memory array includes forming a plurality of one of conductive word lines or conductive bit lines over a substrate. Metal oxide-comprising material is formed over the plurality of said one of the word lines or bit lines. A series of elongated trenches is provided over the plurality of said one of the word lines or bit lines. A plurality of self-assembled block copolymer lines is formed within individual of the trenches in registered alignment with and between the trench sidewalls. A plurality of the other of conductive word lines or conductive bit lines is provided from said plurality of self-assembled block copolymer lines to form individually programmable junctions comprising said metal oxide-comprising material where the word lines and bit lines cross one another.
申请公布号 US8637113(B2) 申请公布日期 2014.01.28
申请号 US201213354163 申请日期 2012.01.19
申请人 SANDHU GURTEJ;SMYTHE JOHN;SRINIVASAN BHASKAR;MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ;SMYTHE JOHN;SRINIVASAN BHASKAR
分类号 C23C18/00;C23C20/00;C23C28/00;C23C30/00;H01C17/06 主分类号 C23C18/00
代理机构 代理人
主权项
地址