发明名称 |
ALIGNING METHOD OF NANO-SIZE MATERIAL USING NANO METER POLISHING AND ELECTRIC DEVICE USING THE SAME AND MANUFACTURING METHOD OF THE SAME |
摘要 |
<p>The present invention relates to an aligning method for nanomaterials using nanometer polishing and a manufacturing method for a device using the same and, more specifically, to an aligning method for nanomaterials using nanometer polishing which forms scratches having a nanoscale width and depth on the surface layer of a substrate in one direction and aligns nanomaterials in the scratches to obtain excellent electrical, mechanical and optical properties and a manufacturing method for an electric device using the same. The present invention provides the aligning method for nanomaterials using nanometer polishing comprising: a step (step 1) of forming scratches which have a width of 1-20 nm and are aligned in one direction on the substrate by using a polishing device; and a step (step 2) of bringing nanomaterials on the substrate in which the scratches are formed and aligning the nanomaterials.</p> |
申请公布号 |
KR101350401(B1) |
申请公布日期 |
2014.01.27 |
申请号 |
KR20120129419 |
申请日期 |
2012.11.15 |
申请人 |
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY |
发明人 |
CHOI, WON JIN;LEE, JEONG O;AN, KI SEOK;YANG, CHEOL SOO;PARK, SE RIN;PARK, DONG WOON |
分类号 |
B82B3/00;H01L21/336 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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