发明名称 |
Monitoring Method and Apparatus for Electron Energy Distribution Characteristics of Plasma |
摘要 |
PURPOSE: A variation monitoring method of an electronic energy distribution property and an apparatus including the same are provided to shorten a calculation time by calculating an EEDF[Electron Energy Distribution Function]in a simple method by utilizing an OES[Optical Emission Spectroscopy]signal. CONSTITUTION: A mathematical modeling about a light intensity is established(S110). An EEDF is measured based on the established mathematical modeling(S120). A monitoring about a process plasma state is performed based on the variation of the measured EEDF(S130). [Reference numerals] (AA) Start; (BB) End; (S110) Establish mathematical modeling about light intensity; (S120) Measure an EEDF based on the mathematical modeling; (S130) Perform a monitoring about a process plasma state based on the variation of the EEDF |
申请公布号 |
KR101354343(B1) |
申请公布日期 |
2014.01.27 |
申请号 |
KR20110123540 |
申请日期 |
2011.11.24 |
申请人 |
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发明人 |
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分类号 |
C23C16/52;H01L21/205;H01L21/3065;H05H1/00 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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