| 摘要 |
A substrate processing apparatus includes a process chamber, a fixed frame, a feed unit, and a supplying unit. A substrate is mounted to the fixed frame, the supplying unit is spaced apart from respective sides of the substrate to supply process fluid to the substrate, and the feed unit transports the fixed frame parallel to a longitudinal direction of the substrate. The process is automatically performed so that loss of the substrate is reduced and the substrate is effectively processed. |
