| 摘要 |
PROBLEM TO BE SOLVED: To provide a system and a method for removing excessive precursor from a processing chamber and preventing a precursor from flowing into a specific area (cavity etc.) behind a shower head.SOLUTION: A substrate processing system 50 comprises a shower head 70, and the shower head includes a base section and a stem section 72, to supply precursor gas to a chamber. A collar 80 combines the shower head 70 with a top surface of the chamber. The collar 80 includes plural slots 86 and is arranged around the stem section 72 of the shower head 70. Purge gas is given a direction to go into the area between the base section of the shower head 70 and the top surface of the chamber through the plural slots 86. |
