| 摘要 |
Provided is a deposition device (100) that causes the deposition of material particles (P) and that comprises: an ionizing unit (20) that ionizes the material particles (P) by means of a photoelectric effect at a reaction chamber to which the material particles (P) are supplied; and electrode sections (32, 34) that guide the ionized material particles (P) to a given region using Coulomb force. |
