| 摘要 |
PROBLEM TO BE SOLVED: To provide a fluid control device capable of preventing fluid from moving away from an intentionally limited region in an immersion lithography apparatus, and preventing the fluid from entering a specific peripheral region outside an exposure region.SOLUTION: In an immersion lithography fluid control system, high pressure gas is used for a fluid control device 25 that holds immersion fluid in an exposure region 40 and a region in the vicinity of the same in a gap between an optical element 4, such as a lens, and a work piece (W) arranged in opposition to an optical member. |
