| 摘要 |
PROBLEM TO BE SOLVED: To provide an excellent image even with respect to the bottom of a hole at a high aspect ratio by improving collection efficiency in an on-axis secondary particle detector since a time for stop milling has to be correctly determined by observing a milling process by using secondary particles in order to prevent the performance of milling over a desired layer when forming a hole by milling with a convergence ion beam.SOLUTION: A splitting grating multi-channel secondary particle detector 320 for a charged particle beam system includes a first grating portion 330a and a second grating portion 330b. The grating portions respectively have independent bias voltages to generate an electric field 303 where on-axis secondary particles 316 discharged from a target are guided by the one grating. A bias voltage can be changed or inverted and secondary particles can be detected by using the respective gratings. The life of the multi-channel particle detector can be prolonged. |
