发明名称 SYSTEMS AND METHODS FOR AT LEAST PARTIALLY CONVERTING FILMS TO SILICON OXIDE AND/OR IMPROVING FILM QUALITY USING ULTRAVIOLET CURING IN STEAM AND DENSIFICATION OF FILMS USING UV CURING IN AMMONIA
摘要 A processing system includes a chamber and a steam source that supplies steam in the chamber. A UV source directs UV light onto a deposited layer of a substrate in the presence of the steam from the steam source for a predetermined conversion period to at least partially convert the deposited layer.
申请公布号 US2014020259(A1) 申请公布日期 2014.01.23
申请号 US201313955763 申请日期 2013.07.31
申请人 NOVELLUS SYSTEMS, INC. 发明人 VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
主权项
地址