POLYMER COMPOSITION, PHOTORESIST COMPRISING SAID POLYMER COMPOSITION, AND COATED ARTICLE COMPRISING SAID PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide polymers with fluorinated backbones for use in extreme ultraviolet (EUV) photoresists which have improved sensitivity as well as high resolution.SOLUTION: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer of the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III). In the formulas, Ris H, F, a Calkyl, or a Cfluoroalkyl, where Ris a Cfluoroalkyl for at least one instance of the monomer of formula (I).