发明名称 |
BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY |
摘要 |
An ion implantation system and method are disclosed in which glitches in voltage are minimized by use of a modulated power supply system in the implanter. The modulated power supply system includes a traditional power supply and a control unit associated with each power supply, where the control unit is used to isolate the power supply from an electrode if a glitch or arc is detected. The control unit then restores connectivity after the glitch condition has been rectified. |
申请公布号 |
US2014021373(A1) |
申请公布日期 |
2014.01.23 |
申请号 |
US201213555910 |
申请日期 |
2012.07.23 |
申请人 |
LUBICKI PIOTR;LEAVITT CHRISTOPHER;MILLER TIMOTHY;KOO BON-WOONG;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
LUBICKI PIOTR;LEAVITT CHRISTOPHER;MILLER TIMOTHY;KOO BON-WOONG |
分类号 |
G21K5/02 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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