| 发明名称 |
POSITIVE PHOTORESIST COMPOSITION, COATING FILM THEREOF, AND NOVOLAC PHENOL RESIN |
| 摘要 |
A positive photoresist composition includes 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A). The novolac phenol resin (B) has a repeating structural unit represented by formula (1) [In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2) |
| 申请公布号 |
US2014023969(A1) |
申请公布日期 |
2014.01.23 |
| 申请号 |
US201214110311 |
申请日期 |
2012.04.10 |
| 申请人 |
IMADA TOMOYUKI;KAGE TAKAKAZU;IMAIZUMI NORIFUMI;DIC CORPORATION |
发明人 |
IMADA TOMOYUKI;KAGE TAKAKAZU;IMAIZUMI NORIFUMI |
| 分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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