发明名称 |
COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, SOLAR CELL ELEMENT, METHOD FOR MANUFACTURING SOLAR CELL ELEMENT, AND SOLAR CELL |
摘要 |
<p>A composition for forming a passivation layer containing a compound expressed by general formula (I): M(OR1) m , and one material selected from the group consisting of a fatty acid amide, a polyalkylene glycol compound, and an organic filler. M includes at least one metallic element selected from the group consisting of Nb, Ta, V, Y and Hf; each R1 individually represents a C1-8 alkyl group or a C6-14 aryl group; and m represents an integer of 1 to 5.</p> |
申请公布号 |
WO2014014114(A1) |
申请公布日期 |
2014.01.23 |
申请号 |
WO2013JP69704 |
申请日期 |
2013.07.19 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
HAYASAKA, TSUYOSHI;YOSHIDA, MASATO;NOJIRI, TAKESHI;KURATA, YASUSHI;TANAKA, TOORU;ORITA, AKIHIRO;ADACHI, SHUICHIRO;HATTORI, TAKASHI;MATSUMURA, MIEKO;WATANABE, KEIJI;MORISHITA, MASATOSHI;HAMAMURA, HIROTAKA |
分类号 |
H01L21/316;C09K3/00;H01L21/312;H01L31/04 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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