发明名称 AUTOMATIC PRESSURE CONTROLLER HAVING HIGH STABILITY CONTROL VALVE FOR SEMI-CONDUCTER PROCESS
摘要 The present invention relates to an automatic pressure controller of a chamber for semiconductor manufacturing process. The automatic pressure controller comprises; a gas pipe for discharging processed gases by connecting a pump for discharging gases from a process chamber inside a casing; a fluid controller, having a bellows fluid block unit moving on a cone shaped inclined surface formed inside the gas pipe line, and in which the fluid block unit is operated by an operating motor; an oxygen detecting sensor for detecting oxygen density among processed gases in a bypass gas pipe line equipped on one side of the gas pipe line; and an automatic pressure controller for semiconductor process capable of controlling the pressure inside the press chamber. By using the present invention, the size of the device can be reduced, and operating failure caused by powder, moisture, or corrosiveness gases included in the gases can be prevented. Also, quick measurement is available depending on changes in control factors such as oxygen density in the process chamber. The quality of the semiconductor is improved and the possibility of creating defective products can be reduced.
申请公布号 KR101347602(B1) 申请公布日期 2014.01.23
申请号 KR20130006427 申请日期 2013.01.21
申请人 PARK, HO HYUN;YOUK, GEUN MOK;KIM, WOONG RYUL;LEE, SEONG MAN 发明人 PARK, HO HYUN;LEE, SEONG MAN;KIM, WOONG RYUL
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址