发明名称 |
TUNNEL FIELD EFFECT TRANSISTOR DEVICE AND METHOD FOR MAKING SAID DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a tunnel field effect transistor device (TFET) and a method for making said device.SOLUTION: The tunnel field effect transistor device comprises at least following layers: a highly doped drain layer 6; a highly doped source layer 2; a channel layer 5; a gate dielectric layer 8 and a gate electrode layer 9 which extend along the source layer 2; and a highly doped pocket layer 3 extending between and along the gate dielectric layer 8 and the source layer 2. The pocket layer 3 extends to between and along the source layer 2 and the channel layer 5. |
申请公布号 |
JP2014013893(A) |
申请公布日期 |
2014.01.23 |
申请号 |
JP20130121057 |
申请日期 |
2013.06.07 |
申请人 |
IMEC;KATHOLIEKE UNIVERSITEIT LEUVEN K.U LEUVEN R&D |
发明人 |
QUENTIN SMETS;ANN S VERHULST;ROOYACKERS RITA;HEYNS MARC |
分类号 |
H01L21/336;H01L29/06;H01L29/16;H01L29/161;H01L29/201;H01L29/66;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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