发明名称 TUNNEL FIELD EFFECT TRANSISTOR DEVICE AND METHOD FOR MAKING SAID DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a tunnel field effect transistor device (TFET) and a method for making said device.SOLUTION: The tunnel field effect transistor device comprises at least following layers: a highly doped drain layer 6; a highly doped source layer 2; a channel layer 5; a gate dielectric layer 8 and a gate electrode layer 9 which extend along the source layer 2; and a highly doped pocket layer 3 extending between and along the gate dielectric layer 8 and the source layer 2. The pocket layer 3 extends to between and along the source layer 2 and the channel layer 5.
申请公布号 JP2014013893(A) 申请公布日期 2014.01.23
申请号 JP20130121057 申请日期 2013.06.07
申请人 IMEC;KATHOLIEKE UNIVERSITEIT LEUVEN K.U LEUVEN R&D 发明人 QUENTIN SMETS;ANN S VERHULST;ROOYACKERS RITA;HEYNS MARC
分类号 H01L21/336;H01L29/06;H01L29/16;H01L29/161;H01L29/201;H01L29/66;H01L29/78 主分类号 H01L21/336
代理机构 代理人
主权项
地址